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Implementation of algorithms to determine the capacitance sensitivity of interconnect parasitics in the Magic VLSI layout tool

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dc.contributor.author Huang, Nick Kuan-Hsiang
dc.date.accessioned 2009-09-21T18:32:15Z
dc.date.available 2009-09-21T18:32:15Z
dc.date.copyright 2009 en
dc.date.issued 2009-09-21T18:32:15Z
dc.identifier.uri http://hdl.handle.net/2429/12924
dc.description.abstract VLSI interconnect capacitance is becoming more significant and also increasingly subject to process variation in the deep submicron regime. A new set of capacitance models is implemented in the Magic VLSI layout tool to improve the capacitance accuracy based on 2.5D capacitance models. This involves a new technology file, equations, and search algorithms. In addition, a simple technique to extract from layout the sensitivity of interconnect parasitic capacitance to linewidth process variation is proposed based on the new capacitance models and implemented in Magic. The derivative of each extracted capacitance with respect to linewidth variation in every level is obtained. Coincident edges in layout result in distinct “shrinking” and “bloating” derivatives. The derivatives therefore form a gradient that may be multiplied by a vector of the variations on each level to give the total expected deviation from nominal capacitance. The gradient allows the process sensitivity of each capacitance to be determined by simply inspecting the netlist. In the end, the impact of process variation is simulated in a crosstalk application to emphasize the necessity of process variation awareness. en
dc.format.extent 3212010 bytes
dc.format.mimetype application/pdf
dc.language.iso eng en
dc.publisher University of British Columbia
dc.relation.ispartof Electronic Theses and Dissertations (ETDs) 2008+ en
dc.title Implementation of algorithms to determine the capacitance sensitivity of interconnect parasitics in the Magic VLSI layout tool en
dc.type Text
dc.degree.name Master of Applied Science - MASc en
dc.degree.discipline Electrical and Computer Engineering en
dc.degree.grantor University of British Columbia
dc.date.graduation 2009-11 en
dc.type.text Thesis/Dissertation en
dc.description.affiliation Applied Science, Faculty of
dc.degree.campus UBCO en
dc.description.scholarlevel Graduate en

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