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Photonic device design flow : from mask layout to device measurement

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Title: Photonic device design flow : from mask layout to device measurement
Author: Lin, Charlie
Degree Master of Applied Science - MASc
Program Electrical and Computer Engineering
Copyright Date: 2012
Publicly Available in cIRcle 2012-10-19
Abstract: Mask layout design is an important part in silicon photonic device design flow; the space used and the quality of the mask directly affect the cost of fabrication and quality of the outcome. To effectively minimize time spent on drawing masks, fixing design violations, and reducing unused spacings between each structure, we use effective approaches in the mask design process to ensure the listed criteria are met. Using the PCell and the hierarchy drawing methods, GDS files that contain different device parameters can be generated efficiently. As a result, direct GDS modeling efficiency is improved. An experimental setup that is capable of obtaining high quality measurement data is critical to device measurement. The concept of an automated measurement station can effectively reduce work needed from the experimenter while providing quality results. With the implemented fiber-to-fiber and fiber array automated measurement station, multi-device measurement can be set up to run automatically in minutes whereas traditional manual measurement stations require one's presence and constant attention. In this thesis, we have illustrated several mask drawing approaches and showed the drawing steps of two masks in detail. We have described two automated experimental setups, fiber-to-fiber and fiber array, in detail and included various measurement results to show the capabilities of these two stations.
URI: http://hdl.handle.net/2429/43510
Scholarly Level: Graduate

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